Magnetron sputtering is one of the main methods for preparing tungsten trioxide thin films. In the process of preparing tungsten trioxide film by magnetron sputtering, the surface characteristics of the tungsten trioxide film prepared by different sputtering powers are also different. The size of the sputtering power also affects the internal properties of the tungsten trioxide film.

Ammonium metatungstate is an important tungsten compound, mainly used for petroleum cracking, organic synthesis, nitration reaction as a catalyst. With the rapid development of petroleum refining, petrochemical and other industries, the consumption of ammonium metatungstate increased rapidly. Relative to ammonium paratungstate, ammonium metatungstate prices are relatively high.

Magnetron sputtering as one of the preparation of tungsten trioxide film preparation methods, has many unique excellent performances. In the process of preparing tungsten trioxide film by magnetron sputtering, there are many differences in the structural properties of tungsten trioxide films prepared by different argon-oxygen ratios. At the same time, the difference of argon-oxygen ratio also affects the surface properties of the tungsten trioxide film.

The transmission spectrum of tungsten trioxide film is a standard for studying the photochromic ability of tungsten trioxide film. The principle is perpendicular to the electromagnetic radiation beam through the transparent electrode, into the diffusion layer of tungsten oxide electrolyte and bulk solution.

Compared with the conventional tungsten oxide material, the nano-tungsten oxide material has quantum size effect and surface effect and plays an important role in the interface-related field. Three-dimensional tungsten oxide nano-materials with large surface area, surface active centers, high crystallinity and loose network structure and other characteristics, the gas sensitivity is expected to show more excellent performance.

At present, in order to prepare tungsten products with high density and high temperature, the pressing and forming properties of tungsten powder are required. Therefore, it is very important to optimize the compacting and forming properties of tungsten powder.

In tungsten fluoride, tungsten hexafluoride (WF6) is the only stable and industrialized production of varieties. It is an important raw material in modern electronics industry. It can be used to produce high-purity tungsten powder as raw material for metal tungsten chemical vapor deposition (CVD) process, especially the WSi₂ made from it can be used as wiring material for large-scale integrated circuit (LSI).