Research in Machining of Cobalt Alloys and CoCrMo Alloys—Ⅰ

ECAFM results for a cast CoCrMo alloy in PBS image

Research into the processing of cobalt alloys and CoCrMo alloys, which are widely used in manufacturing and aerospace, began a long time ago. Prior to that, all research was focused on improving material properties such as hardness, toughness, strength, wear resistance, corrosion resistance, and high-temperature resistance. Cobalt-chromium-molybdenum alloys are an improved material from the cobalt family and are used in a variety of biomedical applications.

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Machinability of Cobalt Chromium Molybdenum Alloys—Ⅱ

Categories of difficult-to-machine materials image

In general, the term machinability can be defined as how easily the material can be machined or cut to the desired shape in terms of tool and process conditions, taking into account surface finish and tool life. The machinability of cobalt chromium molybdenum alloys is comparable to other advanced materials such as nickel and titanium alloys, which are classified as difficult-to-cut materials due to their unique characteristics of high strength, toughness, wear resistance, and low thermal conductivity.

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Machinability of Cobalt Chromium Molybdenum Alloys—Ⅰ

Applications of cobalt base alloys in engineering and medical products image

Cobalt chromium molybdenum alloys are considered advanced materials and are popular in a variety of engineering and medical applications. However, it is classified as a difficult material to machine due to its unique combination of properties, including high strength, toughness, wear resistance, and low thermal conductivity.

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Effect of Zrb2 Addition on 93wt% Tungsten Heavy Alloy

ultrafine W-Ni-Fe composite powders image
Recently, it has been reported that 93wt% heavy tungsten alloys reinforced with highly uniformly dispersed ZrO2 particles have been prepared by powder metallurgy. The effect of the addition of zirconium boride (ZrB2) on 93wt% tungsten heavy alloys was investigated.

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Tungsten Disulfide for Laser Saturable Absorbers Application

Tungsten disulfide saturable absorbers for 67 fs mode-locked erbium-doped fiber lasers image

The researchers found that tungsten disulfide (WS2) can be converted into a direct semiconductor with a band gap of 2.1 eV by controlling the chemical composition and number of layers due to the quantum confinement effect. In addition, WS2 has better saturable absorption properties than graphene and carbon nanotubes in the near- and mid-infrared bands. Due to these excellent properties, it is increasingly being used in laser saturable absorbers (SAs).

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Tungsten Disulfide for Electrocatalysis Application

XPS spectrum of the S 2p and W 4f signals for the pristine image

Tungsten disulfide (WS2) is promising electrocatalysis with a layered structure with adjustable electrical properties and exposed edges that can act as the active center. It is mainly used as an electrocatalyst for hydrogen evolution reactions. The surface of WS2 is inert; however, the catalytic activity of WS2 occurs at the lamellar edges, which determines the overall catalytic performance. In order to improve the catalytic effect of WS2, the electrolyte must be in complete contact with the WS2 layer.

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WS2 Films for Catalysis Application

Catalytic decomposition of different samples under ultraviolet light irradiation image

Due to its unique band gap properties, inherent vacancy defects, and low electrical conductivity, WS2 films can be used for catalysis. Catalysis including photocatalysis and electrocatalysis is essential in our daily life, and they have been widely used for environmental protection and clean energy generation.

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Stripping Method for WS2 Preparation

WS2 film preparation by mechanical stripping and liquid-phase stripping and lithium-ion intercalation image

Bulk tungsten disulfide (WS2) can be stripped by physical and chemical methods, which are classified as mechanical and stripping method, and lithium-ion intercalation method. In recent years, in order to obtain large-area, high-quality monolayer tungsten disulfide films, researchers have tried to grow monolayer tungsten disulfide films on ingot substrates and then exfoliate them by atomic or molecular intercalation methods.

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Chemical Methods for WS2 Film Preparation

Schematic of the processes for producing WS2 thin films by one-step CVD and hydrothermal method image

Two common methods for preparing tungsten disulfide (WS2) films by chemical methods are chemical vapor deposition (CVD) and hydrothermal growth of single-crystal tungsten disulfide from aqueous solutions under high temperature and pressure conditions. CVD is the most common method used to prepare tungsten disulfide. The CVD method involves a reaction process in which a gaseous precursor reacts chemically on a solid surface to produce a solid deposit.

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Properties of Tungsten Disulfide

Schematics of the deposition chambers for WS2-CF coating prepared by magnetron sputtering image

Owing to unique physical and chemical properties, transition metal dichalcogenides (TMDs) attract research interest. Among the family of TMDs, tungsten disulfide (WS2) has a unique band structure due to its semiconductor properties; i.e., its broadband spectral response characteristics, ultra-fast bleaching recovery time, and excellent saturable light absorption.

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