Tungsten Carbide Cutting Tool Edge Passivation Case

The extremely sharp and smooth enough neat cutting edge machining to have a specific, smooth shape, and edge rounding mostly waterfall edge, this process is called edge passivation. tungsten carbide cutting tool edge passivation change the contours of the cutting edge and morphology, but also to improve the microstructure of the blade surface area, thereby affecting the cutting process, tool performance and workpiece quality. tungsten carbide cutting tool edge passivation impact, affecting mainly the following aspects: the distribution of cutting temperature, the size distribution of cutting force, stress and strain, and chip formation and chip flow, deformation region of the workpiece, the workpiece surface integrity (residual stress), the machined surface roughness, surface hardening process and tool wear resistance.

Edge passivation tungsten carbide cutting tools for working efficiency has an important role in the following cases generally require the tool edge passivation:
1. The new sharpening of tungsten carbide cutting tools or regrinding of tungsten carbide cutting tools.
2. Prior to the tungsten carbide coating.
3. When the impact of heavy-duty cutting or cutting edge tungsten carbide cutting tools needed to passivation.

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The Focus Direction of Tungsten Alloy Research in the Future(b)

High quality tungsten alloy penetrator is an important symbol of national materials technology development, but also an important material for high performance kinetic energy penetrators, which will be related to the development of standards to improve our standard of weapons and equipment needed can win a local war.

To this end, it should address some of the issues and the actual needs of the existing one hand, vigorously strengthen the management and coordination of military material development project, on the other hand should further improve the scientific management level of research institutes and universities to form a kind of systematic and highly complementary mechanism, and created a high standard of professional research team, in order to promote China's missile tungsten alloy materials technology to develop low-input, high output, high standards and high availability of direction. And should strive to achieve a breakthrough in the short term in some key technologies in order to be able to significantly improve the overall performance of armor-piercing tungsten alloy material.

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Effects of Annealing Temperatures on Tungsten Oxide Films

The effects of annealing temperatures on the structure and optical property of tungsten oxide thin films by sputtering WO3 target have been investigated. It is found that the annealing treatments at 400℃ in the air caused as-deposited amorphous WO3 thin films to crystallize into the hexagonal WO3 phases accompanied by the triclinic phase. Increasing annealing time at 400℃ can improve the crystallinity of WO3 thin films and lead to a rougher surface morphology, where nanorod-like structure can be clearly observed. The resups from Raman spectra further confirmed the crystallinity of WO3 thin films with distinct vibration peaks of the W-O bonds and lattices after annealing at 400℃. When the annealing temperature increases from the room temperature to 400℃ the optical behaviors of the tungsten oxide thin film can be effectively influenced and the corresponding band gap varies from 2.82 eV to 3.27 eV.
 
 
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Crystallinity and Growth of WO3 Films during Sputtering

It is well known that during the sputtering, the interaction between Ar plasma and WO3 bulk can highly distort and tilt the form works of the WO6 octahedra and thus results in an amorphous film. At the same time, a large number of oxygen vacancies and defects, which can reduce the tungsten ions from W6+ to W5+ or W4+, would be produced in the deposited films. This is responsible for the violet-red color and the amorphous XRD data of the films annealed below 300℃. The obvious crystallinity of the deposited films at 400℃ for 60 min implies that the defects and disordered structures in the films have been effectively activated by this temperature. Consequently, increasing the annealing time at 400℃ is obviously favorable to the crystallinity and the growth of the films.
 
 
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Structure and Optical Property of Tungsten Oxide Films in Different Conditions

As we all know, annealing, or thermal, treatment is one of the most effective ways to influence the structure and the properties of many films. To investigate the effects of the annealing temperatures on the structure and optical property of tungsten oxide thin films that were deposited by magnetron sputtering of WO3 bulk in a vacuum, the deposited films were annealed at 200℃ and 300℃ for 60 min and at 400℃ for 60 min and 180 min in air, respectively. We find that the annealing temperature of 400℃ can effectively influence the structure and optical property of the deposited films. The films annealed at 200℃ and 300℃ display violetred under the sunlight as well as the as-deposited ones. Nevertheless, the film annealed at 400℃ exhibits transparency and appeared to be blue colored.
 
 
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Tungsten Oxide Films Preparation Techniques

Several preparation techniques have been used to deposit tungsten oxide thin films, including sol-gel, hydrothermal technologies, chemical vapor deposition, thermal evaporation, pulsed laser deposition, and magnetron sputtering. In fact, reactive magnetron sputtering is one of the most versatile techniques to deposit oxide films, allowing the control of many properties of the films by changing the partial pressure of the reactive gas, the components with the different targets and even sputtering power. Many reports have been published explaining the mechanisms involved in thin film growth using magnetron sputtering, but very often these refer to tungsten oxide thin films obtained from a metallic tungsten target. In contrast, the reports on tungsten oxide thin films obtained from a WO3 target are seldom reported. In 2009, Acosta et al. reported the studies on the optical properties of tungsten oxide thin films by non-reactive sputtering of WO3 target and found that the argon pressure had a strong influence on the optical properties of the film. It has been predicted that a large amount of oxygen vacancies, defects and disordered structures in the deposited films, which are very critical in determining the crystalline, optical, photochemical and electric properties of tungsten oxide thin film, would be produced when the sputtering plasma interacts with WO3 bulk.
 
 
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Tungsten Oxide Films Properties and Uses

In the past few years, an increasing interest has been put on the tungsten oxide films due to their potential applicanons in smart windows, gas sensors, photocatalytic reactions, and optoelectronic devices, etc. The unique properties of the tungsten oxide films were usually determined by the oxygen defects and the valence states of tungsten ions. Besides, it is very important to improve the properties of tungsten oxide films and other oxide films by controlling their morphologies and crystalline phases, which mainly depend on the preparation technologies and thermal treating temperatures and atmospheres.
 
 
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Tungsten Powder Produced With Nanoscale Powder

  (1)The nanoscale tungsten powder with an average particle size of 19 nm was obtained by gradually reducing WO3, which was prepared by ultrasonic spray and thermochemical conversion process, into WO2.90 and W.
 
  (2)Compacting with a rubber die is a preferred method for making a tungsten green compact with the nanoscale powder, whereby a relative density of 46.2% was achieved.
 
  (3)The compact made from the nanoscale tungsten powder starts shrinkage at 1050℃, and the shrinkage rate is maximum at 1210℃. The shrinkage almost ends at 1500℃. In the case of the traditional tungsten powders, however, the compacts barely shrink.
 
  (4)After sintered in hydrogen at 1500℃, tungsten samples with a relative density of 96.4% and a particle size of 5.8 pm were prepared. As for the traditional tungsten powder, the relative density is only 68.2% after sintering.
 
 
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Compaction of Nanoscale Tungsten Powder

Nanoscale tungsten powders were compacted with a steel die and a rubber die respectively. In the case of compaction with a steel die, the relative density of the resulted compact is 28.3% when the unit compacting pressure is 200 MPa. When the compacting pressure was higher than 200 MPa, some defects such as delamination and fracture were observed in the compacts.
 
The compacting pressure for a rubber die can be up to 300 MPa, resulting in a compact free of detects with a relative density of 46.2%. Even with a compacting pressure of 200 MPa, the relative density of the compact can also be up to 44.0%, which is remarkably more than that obtained by compacting with a steel die. It shows that the green density of nanoscale tungsten powder can be greatly improved by compacting with a rubber die.
 
 
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Preparation of Nanoscale Tungsten Powder

Blue tungsten oxide WO2.90 was prepared by reduclion of nanosclae WO3 at 500℃ for 40 min in hydrogen. Subsequently, the resulted blue tungsten oxide was reduced at a series of temperatures for 60 min to get tungsten powders.
 
The average particle size of tungsten powder reduced at 720℃ is 19 nm, which is much less than that of conventional tungsten powder. The particle size of tungsten powder increases with increasing the reduction temperature. In addition, the tungsten powder reduced at 680℃ is so fine that it self-ignited after taken out from the reduction furnace. Nanoscale tungsten powders reduced at 720℃ and 780℃ keep stable in the air. Therefore, 680℃ can not be applied as a reduction temperature. The nanoscale tungsten powder should be stored in vacuum bags or bags filled with inert gas.
 
 
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