Thermal Evaporation Method Producing Tungsten Oxide Nanowire
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- Category: Tungsten Information
- Published on Friday, 29 May 2015 17:39
- Written by xiaoshan
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Thermal evaporation method is a vapor deposition method, and it has a high efficiency character. Production tungsten oxide nanowires process is firstly setting base pressure to 10-1Pa, work forced to 10Pa, evaporation time is 15min.
Then put tungsten powder on the stove and silicon wafer near tungsten powder by horizontally. Then putting inert gas clean up argon gas and the inert gas flow is 70sccm. Finally heating tungsten powder and it will oxidize to tungsten oxide then grow deposited on a silicon wafer developed to nanowires. At the same time the evaporation temperature are set to 975 ℃, 1000 ℃, 1025 ℃, 1050 ℃, wafer silicon temperature was maintained at 550.
After study experts found that the growth of tungsten oxide nanowires exist certain rules, with the evaporation temperature, the vapor concentration in the silicon surface can also become large, over saturation increases, increasing the number of nucleation, tungsten oxide nanowires diameter increases, the height of increase first then to decrease, reduce the crystal orientation when the temperature is too high. The wafer silicon temperature increase, the active of tungsten oxide vapor molecules on silicon becomes large and the crystallization speed of tungsten oxide nanowires accelerate, height has increased. It is easy to found producing different morphologies tungsten oxide nanowires can through control evaporation source and the wafer temperature.
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Producing Tungsten Oxide Electrochromic Films Methods
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- Category: Tungsten Information
- Published on Friday, 29 May 2015 17:37
- Written by xiaoshan
- Hits: 431
Producing tungsten oxide electrochromic films has some methods such as vacuum thermal evaporation, electron beam evaporation, sputtering, vapor deposition, electro deposition and sol - gel method. Tungsten oxide electrochromic film deal with heat treatment with certain temperature can improve the adhesion and cycle life, but the high temperature heat treatment it will affect the response time and color film. Generally, physical production methods require high temperature heat treatment, such as electron beam evaporation required 500e heat treatment, thermal evaporation required 350e, the RF sputtering for an 200 ~ 300e. These methods often are limited because the equipment is expensive, technically complex and demanding of process conditions. Chemical production of the sol - gel method is simple equipment and it can produce large-scale uniformity film with low temperature, but usually need more than 100e heat treatment. Alkoxide method requires 250e heat treatment, the ion exchange method needs 150e, halogenated oxidation method needs 120e.
But using sodium tungsten as raw material and ethanol and polyvinyl alcohol (PVA) as an additive, obtained tungsten acid solution by ion exchange, and then using sol - gel method to producing superior performance tungsten oxide electrochromic films. This film simply need 75e heat treatment, the driving voltage of -1 ~ + 1V, fully shaded and faded time of only a few seconds, coloring in an aqueous solution - fade cycles up to 600 times, the color can be kept after coloring the number of days.
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Tungsten Carbide Rod with Holes
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- Category: Tungsten Information
- Published on Friday, 29 May 2015 17:34
- Written by Cristina
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Tungsten Carbide Rod with Holes
Tungsten carbide rod can be made into tungsten carbide rod with single straight hole, tungsten carbide rod with dual straight holes and tungsten carbide rod with double helix hole. Tungsten carbide rod with holes can be used to make all kinds of tungsten carbide tools, processing heat-resistant alloys and Ti alloy. Tungsten carbide rod with hole also plays a part in cooling process of machining.
Below is the common dimension of tungsten carbide rod with holes.
|
Outer Diameter(mm) |
Tol(mm) |
Inner Diameter(mm) |
Tol(mm) |
TK(mm) |
Tol(mm) |
Hole Deviation(mm) |
|
Φ6.3 |
+0~+0.3 |
1.0 |
±0.10 |
3.0 |
-0.2< |
0.15 |
|
Φ8.3 |
1.0< |
±0.15 |
4.0 |
-0.3 |
0.15 |
|
|
Φ10.3 |
1.4 |
±0.15 |
5.0 |
-0.3 |
0.25 |
|
|
Φ12.3 |
+0~+0.4 |
1.75 |
±0.15 |
6.0 |
-0.5 |
0.30 |
|
Φ14.3 |
1.75 |
±0.15 |
7.0 |
-0.5 |
0.37 |
|
|
Φ16.3 |
2.0 |
±0.20 |
8.0 |
-0.5< |
0.40 |
|
|
Φ18.3 |
+0~+0.5 |
2.0 |
±0.20 |
9.0 |
-0.8 |
0.50 |
|
Φ20.4 |
2.5 |
±0.25 |
10.0 |
-0.8 |
0.50 |
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Ultrasound Chemical Method Producing Nano Tungsten Oxide
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- Category: Tungsten Information
- Published on Friday, 29 May 2015 17:35
- Written by xiaoshan
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Ultrasound chemical method is an effective method for produce specific nano materials. It is a convenience, effective and safe method which organic bond with physical method and chemical method, and it developed as an important method such as synthetic material and handling materials, so it has aroused great interest and attention.
And with the application of nano-tungsten oxide powder is increasingly widespread, it is recognized that tungsten oxide nano-particles agglomeration issues that affect the performance of the powder. Therefore, during tungsten oxide nano powder produce in addition to pay attention to fallow the influence which tungsten acid nano particle will affect tungsten oxide particle size and at the same time how to control the nano tungsten oxide particle increase is also a key issue.
So, while using ultrasound-assisted chemical adding surfactant can not only improve the chemical reaction of the micro-environment, but also can product micelles which it can as templates for formed synthesis nanomaterials in the solution.
at a temperature of 500 ℃,using ultrasound chemical method adding surfactant and calcine tungsten acid for 3hours which can get better nano-oxide powder material. And this method also has some advantages such as low cost, simple and easy handling and so on.
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Tungsten Sputtering Target in Tool and Mould Coating Application
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- Category: Tungsten Information
- Published on Friday, 29 May 2015 17:32
- Written by Yahong
- Hits: 1700
Tungsten sputtering target is made of tungsten powder. Tungsten sputtering target owns three types: flat-target type, arc-target type and rotary target type. Tungsten sputtering target can be applied in tool and mould coating, glass coating, or high temperature resistance, wear resistance, corrosion-resistant in high-grade decorative items and other industries.
Tungsten sputtering target in tool and mould coating application:
With the development of aerospace and automotive industry and the advance of technology and the improvement of production efficiency, people are pursuing tungsten sputtering targets with high-performance in tools and moulds. Currently, European countries and Japan are in great need for the tool and mould. According to statistics, the proportion of demand in developed countries is more than 90%, while China's demand for coated tool is rising.
Tool and mould coating application is mainly used for tools and mould coating. After the mold coating, its surface will be strengthened, the use of life will improve, in short, all aspects of performance will be enhanced.
Commonly used decorative coating materials are: tungsten, titanium, aluminum, etc.
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