Tungsten Sputtering Target

Tungsten sputtering target is made of tungsten powder. Tungsten sputtering target owns three types: flat-target type, arc-target type and rotary target type.

Because target quality will directly affect film performance, so the tungsten sputtering targets must meet the following requirements:

High purity; the higher purity of the tungsten sputtering target, the better effect of spray sputtered film and electrical and optical properties, and the stronger of corrosion resistance. In general, semiconductor devices and monitors purity of tungsten sputtering target have more stringent requirements, for example, a magnetic thin film of tungsten target purity requirements is generally above 99.9%.

High density;

Small grain size;

Low impurity content; tungsten sputtering target, as a cathode, its main sources of pollution is from the pores of oxygen in the water and solid impurities. We can obtain the higher purity of tungsten sputtering target by lowering the impurity content.

Even composition and homogeneous structure are required.

 

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