Tungsten Sputtering Target Operating Principle

Tungsten sputtering target is made of tungsten powder. Tungsten sputtering target owns three types: flat-target type, arc-target type and rotary target type.

Tungsten sputtering target operating principle:
In a high vacuum chamber, applying orthogonal magnetic fields and electric fields to the anode and the cathode (the sputtered target pole) and filling a required inert gas (argon, etc.).Then, the permanent magnet will create a magnetic field and compose a crossed electric and magnetic field with high voltage electric field in the target material surface. Under the influence of an electric field, argon gas will ionizing (ions and electrons), which is emitted from the target electrode of the electron magnetic field will be in the vicinity of the cathode and can form a high density plasma. Under Lorenzo magnetic effect, Ar ions are accelerated to fly to the target surface and bombard the target surface at a faster rate, and then sputtered out from the target atoms will be greater momentum toward the substrate and the deposited in film.

 

Tungsten Metals Manufacturer & Supplier: Chinatungsten Online - http://www.tungsten.com.cn
 Tel.: 86 592 5129696; Fax: 86 592 5129797
 Email: sales@chinatungsten.com
 Tungsten & Molybdenum Information Bank: http://i.chinatungsten.com
 Tungsten News & Tungsten Prices, 3G Version: http://3g.chinatungsten.com
 Molybdenum News & Molybdenum Price: http://news.molybdenum.com.cn

• < Prev
• Next >