Effect of Deposition Temperature on the Tungsten Tube Morphology and Structure

Under different deposition temperature (500 ℃, 600 ℃, 700 ℃ and 800 ℃), keeping the composition proportion and the inlet content of WF₆ and H₂ the same amount, the cross section metallographic microstructure of the tungsten tube processed by CVD (Chemical Vapor Deposition) is different.

When the deposition temperature is lower(500 ℃), the organization of the deposited layer presenting fine crystalline column;

When the deposition temperature reach 600 ℃, the speed of the tungsten atoms generated by the chemical reaction of the reduction will accelerate. In the deposition process, some grain grow ing occasionally get the lateral growth space and grow, which will make deposit layer of column grain structure coarsening.

Some occasional rapid growth of the grain growth to obtain the lateral growth space and growth

When the deposition temperature is raised to 700 ℃, the speed of the tungsten atoms generated by the chemical reaction of reduction has been very fast, these tungsten atoms deposited on surface of deposition will restart growth interface nucleation and further growth. In this process, morphology of the deposited layer will change significantly. Re-nucleation process will result in, firstly, columnar crystal growth pattern of the deposition layer will tend to clutter; secondly, the crystal grain of deposition layer will obviously refined.

If the deposition temperature rising to 800 ℃, re-nucleation process will be more obvious, at the same time, the microstructure of the deposited layer has lost columnar crystal growth characteristics, and its organizational form is messy and grain size is uneven.


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