Tungsten Oxide Photochromic Research Status

Tungsten oxide is a good photochromic material, in 1973first reported amorphous tungsten oxide film photochromic phenomenon that has been widespread concern and research. In 1980 Gerard and others based on the previous first used vacuum deposition method, by changing the degree of vacuum to produce HXWO3-Y films. Then after that they switched to a sputtering method, in Ar-O2 (preparation pure sub-stoichiometric film), Ar-O2-H2 and Ar-O2-H2O (changing composition WO3 hydroxide) these three different atmospheres sputtering and prepared HXWO3-Y film. However, due to the vacuum deposition method and sputtering method equipment is expensive and technically complex, and the complex molecular structure of the film and ordered the film can not be prepared, besides it is difficult to control the film thickness and size, and more importantly, they are not easy to produce a large area so it is difficult to be widely used. With the development of technology there are many methods for the producing tungsten oxide, such as electron beam vapor deposition method, electrodeposition., spray pyrolysis, sol - gel method. Where the sol-gel method can produce different crystal structure, different degrees of dense material, easy to control the composition and particle size and easy production large area uniform films and other advantages, so now most researchers have been using and continue to develop.

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