Tungsten Target in Thin-film Material Application
- Details
- Category: Tungsten Information
- Published on Thursday, 28 May 2015 17:02
Tungsten target is also known as tungsten sputtering target. With high melting point, elasticity, low coefficient of thermal expansion, resistivity and fine heat stability, pure tungsten and tungsten alloy targets are widely applied in electrical industries (such as, LED and LCD), chemical equipment (X-Ray tube, thin-film material, semiconductor integrated circuit, two-dimensional display, solar photovoltaic and surface engineering.), medical equipment, smelting equipment, rare earth smelting, aerospace and many other fields.
Now a new way-PVD (physical vapor deposition) has been used to sputter thin-film material. The product made in this way owns high density, smooth surface, no stratification, no double skin, no crack and no impurity and good adhesiveness. And with the growth demand of high pure metal and alloy targets, the magnetron sputtering techniques has been widely applied. It can work with both older sputtering devises as well as the latest process equipments, such as large area coating for solar energy or fuel cells and flip-chip applications.
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