Evaporation Method Producing Nano Tungsten Trioxide Films

Nano tungsten trioxide films have been used widely in modern technology, and the application and research has became more and more popular. It also has a lot of producing method. But the nature of the film is closely related to the producing and producing conditions, WO3 films proceed by different preparation methods vary in size and crystalline form, common methods are summarized below: Evaporation, sputtering, chemical vapor deposition, electro deposition and sol - gel method and so on. Materials at high temperatures will evaporation, then to producing a variety of thin film materials. Evaporation method has some obvious advantages, such as higher deposition rate, a relatively high degree of vacuum and high purity of the resulting film and the like. Evaporative cooling method include evaporation, electron beam evaporation, arc evaporation, laser evaporation method, a hollow cathode evaporation, thermal evaporation method or the like, wherein the thermal evaporation method is one of the more used methods. Purity films prepared by evaporation is high, the particles dispersed. By varying the pressure and temperature controlled atmosphere, different particle sizes can be prepared nano film, suitable for the synthesis of low melting point, film or particulate matter of a single component. However, this production method generally requires high temperatures and vacuum conditions, preparation of complex and expensive equipment, suitable for the preparation of large area thin film.

 

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