Tungsten Oxide Nanostructures Synthesis

Category vapor deposition is very wide, generally refers to a gas phase source material under conditions in which aggregation to the target substrate. Producing a tungsten oxide, typically by physical vapor deposition (PVD). PVD method can be directly used as the source of tungsten oxide, tungsten oxide, sublimation deposition method with high energy evaporation, such as ion bombardment, heating, ion beam, laser radiation and the like. By controlling parameters, can be achieved nano-sized crystals, the formation of morphology, a tungsten source is not necessarily the tungsten oxide, may also be a powder or a filamentous tungsten simple substance, additionally must introduce oxygen or other oxidizing agents to form the WO3 the gas phase. In many cases, PVD method build is WOx instead WO3, color deposits usually can calculate the stoichiometric ratio, usually black film was formed deletion WOx material are formed by means of the oxygen atom; translucent dark blue color film is formed WOx (x = 2.7); yellow-green is a description of the formation of the WOx. Typically, the heat treatment can be controlled by the oxygen content in the resultant crystal phase composition and the stoichiometric ratio. Vapor-phase synthesis commonly used sputtering, vapor evaporation and some other PVD method.

Sputtering target is bombarded with high-energy particles produced atomic film growth method, the advantage is controllable, growing out of the crystal structure of the film has good controllability. A sputtering method is easier to control, can achieve rolling production in mass production, and therefore, in the industrial production of the tungsten oxide, the sputtering method has a very wide range of applications.

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