Synthesis of Nanostructured Tungsten Oxide Crystalline Films

Over the last decade, nanostructured tungsten oxide materials have attracted much interest due to their potential for catalyst, gas sensors, and electrochromic material applications. Several studies have been conducted by using various techniques, including the oxygen plasma processing, plasma sputtering, chemical solution, sol-gel techniques, electron beam evaporation deposition, electrochemical etching, and the chemical vapor deposition techniques. Most work concerned the synthesis of nanoparticles for catalytic applications based on chemical solution methods.

The nanostructured tungsten oxide materials were synthesized using a simple hot filament CVD technique. The details of the process were described elsewhere in our previous publications. The tungsten filament acted as a precursor for tungsten oxide, and no catalyst or other tungsten-containing compound precursor was used. Both AlN and A ceramic substrates were used. Prior to the experiments, the substrates were ultrasonically washed in the methanol solution for 5 minutes, and dried with helium. After placing the substrate, the chamber was pumped down to Torr and then fed with the Ar gas (purity: 75%) to ambient pressure. During deposition, the gas inside the chamber was in a static state. The distance between the hot filament and substrate remained unchanged. The substrate temperature was controlled by adjusting electrical current on the hot filament, which was different from our previous experiments where the substrate temperature was controlled by simply changing the distance between the substrate and the hot filament.

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