Tungsten Oxide Film

In the past few years, an increasing interest has been put on the tungsten oxide films due to their potential applications in smart windows, gas sensors, photocatalytic reactions, and optoelectronic devices etc. The unique properties of the tungsten oxide films were usually determined by the oxygen defects and the valence states of tungsten ions. Besides, it is very important to improve the properties of tungsten oxide films and other oxide films by controlling their morphologies and crystalline phases, which mainly depend on the preparation technologies and thermal treating temperatures and atmospheres.

Tungsten oxide thin films were deposited on glass substrates by the magnetron sputtering of WO3 bulk at room temperature. The deposited films were annealed at different temperatures in air. The structural measurements indicate that the films annealed below 300 C were amorphous, while the films annealed at 400 C were mixed crystalline with hexagonal and triclinic phases of WO3. It was observed that the crystallization of the annealed films becomes more and more distinct with an increase in the annealing temperature. At 400C, nanorod-like structures were observed on the film surface when the annealing time was increased from 60 min to 180 min. The presence of W=O stretching, W–O–W stretching, W–O–W bending and various lattice vibration modes were observed in Raman measurements. The optical absorption behaviors of the films in the range of 450–800 nm are very different with changing annealing temperatures from the room temperature to 400C. After annealing at 400C, the film becomes almost transparent. Increasing annealing time at 400C can lead to a small blue shift of the optical gap of the film.

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