Tungsten Carbide Cutting Tool CVD Coating Technology Development

Details: Category: Tungsten Information; Published on Monday, 03 November 2014 18:17

Tungsten carbide cutting tool coating previously usually adopted high-temperature chemical vapor deposition (GTCVD) technology. According to the constituents of the sediment, clean gases like H2、CH4、N2、TiCl4、AlCl3、CO2, after mixed in a certain proportion, are applied on the blade surface of tungsten carbide cutting tool with certain temperatures (generally 1000~1050℃) in the deposition system under ordinary or negative pressure. Up to now, HTCVD is still the most popular technology in this area. In addition, there is also anther technology called plasma chemical vapor deposition (PCVD) applied in tungsten carbide cutting tool coating. Due to its relatively low technological temperature (700~800℃), it reduces the bend resistance of the blade.

Later on, multilayer coating with different combinations have been developed, such as TiCN/Al2O3、TiCN/TiC/TiN、TiCN/TiC/Al2O3、TiCN/Al2O3/TiN、TiCN/TiC/Al2O3/TiN、TiCN/Al2O3/TiCN、TiN,TiC/TiCN/TiN、TiN/TiCN/TiN and so on.

We can clearly see that in recent years, TiCN or TiN are often used as the bottom layers due to the improvement of tungsten carbide substrate. For example, gradient structure is taken, so that it is possible to take TiCN or TiN as the bottom layers. Besides, TiN is not suitable to be applied alone, because TiN has less improvement in its hardness compared with tungsten carbide. That is why TiN has to be used in combination with TiC, TiCN and Al2O3.

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