Bismuth Tungstate Photocatalyst Thin Film Preparation

With the increasingly serious environmental pollution and energy crisis, photocatalytic technology has attracted the attention of the domestic and foreign scientific circles for its potential application in the field of environmental purification and new energy materials, as well as the advantages of high efficiency, economy and environmental protection in the treatment of environmental pollution.

Bismuth tungstate photocatalytic material is an ideal photocatalytic material because of its excellent response to ultraviolet and visible light, stable photocatalytic performance, good thermal stability, low cost and environmental friendliness. Bismuth tungstate Nanomaterials Synthesized by hydrothermal method have special layered structure and larger specific surface area. Compared with other photocatalysts, the application of Bismuth tungstate nanomaterials in surface catalysis has more obvious advantages.

In order to prepare high-purity and high-quality bismuth tungstate photocatalytic materials, some scholars have provided a kind of bismuth tungstate photocatalytic thin film and its preparation method.

1)Preparation of Bismuth Tungstate Powder: Sodium tungstate solution was obtained by dissolving Na₂WO₄·2H₂O in distilled water, Bi(NO₃)₃.5H₂O was dissolved in dilute nitric acid to obtain Bismuth nitrate solution, and the sodium tungstate solution was slowly dripped into Bismuth nitrate solution, in which the molar ratio of Na₂WO₄.2H₂O to Bi(NO₃)₃.5H₂O was 1:2, which was stirred until the solution was well mixed. The precursor solution is obtained by dropping the sodium hydroxide solution to adjust the pH value of the solution to 5-7. The precursor solution is placed in a hydrothermal reactor for hydrothermal reaction. After hydrothermal reaction, the solid component is separated by centrifugation and the bismuth tungstate powder is obtained by vacuum drying of the solid component.

2)Preparation of Bismuth Tungstate Photocatalytic Films: Step 1) The Bismuth Tungstate powder is pressed to form the billet by dry pressing, and the billet is sintered at high temperature to obtain the target material needed for sputtering. The target material is put into the magnetron sputtering chamber, and the quartz glass is cleaned by distilled water, acetone and ethanol in turn and then put into the magnetron sputtering chamber. Bismuth tungstate photocatalytic thin films were prepared by controlling the vacuum of magnetron sputtering chamber (< 2.0 *10-3Pa) and argon as working gas, adjusting sputtering pressure, sputtering power and sputtering time.

Bismuth tungstate photocatalytic film material is prepared by magnetron sputtering technology, which is simple, repeatable, high efficiency and low cost. The film prepared by magnetron sputtering technology has high purity, uniform thickness, good compactness, excellent photocatalytic performance and wide application in pollution control and sputtering. It has strong practical value and application prospect in line treatment, bacteria elimination and antivirus.

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