Stanford Prof. Honored for Excellence in Semiconductor Research
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- Category: Tungsten Information
- Published on Thursday, 21 February 2013 16:33
The Semiconductor Industry Association, representing American leadership in semiconductor manufacturing and design, recently presented its 2012 University Researcher Awards to Stanford University professors Krishna Saraswat and Bruce Wooley in recognition of their outstanding contributions to semiconductor research.
Saraswat's research interests include new and innovative materials, structures, and process technology of silicon. He pioneered the technologies for aluminum/titanium layered interconnects, CVD of tungsten silicide MOS gates, CVD tungsten MOS gates and tunable work function SiGe MOS gates.
Saraswat has graduated 70 doctoral students and has authored or co-authored over 620 technical papers, six of which have received Best Paper Awards from the Institute of Electrical and Electronics Engineers.
"This is a richly deserved honor for Professor Saraswat and Professor Wooley," Larry Sumney, president and CEO of the Semiconductor Research Corporation, stated in a press release. "By continuously working to discover the next big breakthrough, these researchers are ensuring that the semiconductor industry remains the backbone of American innovation."
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