Production Method of High-Purity Molybdenum Electrode

At present, there are two production methods for producing molybdenum electrodes, namely the smelting method and the powder metallurgy production method. The molybdenum electrode produced by the smelting method owns high purity, low N, O and other gas content, it could reach the level of less than 10ppm, but the production cost is high. The powder metallurgy method is low-cost, but the content of C and O is too high to meet the requirements of the glass fiber industry. Therefore, a new production method for producing high-purity molybdenum electrode is required.

Molybdenum powder image

Molybdenum powder with a particle size of 2.5μm-4.0μm and an oxygen content of 400ppm-600ppm (quality purity of 99.9%) is pressed into a molybdenum billet, and then the molybdenum billet is placed in a resistance sintering furnace under vacuum or reducing atmosphere pre-sintering is carried out under (hydrogen) protective conditions. The pre-sintering process is to first heat up and pre-sinter to 1200°C from room temperature for 4h, then keep it warm, heat up and pre-sinter to 1350°C for 1h - 2h.

The pre-sintered molybdenum billet is placed in an intermediate frequency induction furnace and sintered under hydrogen as a protective atmosphere to obtain a molybdenum electrode with a mass purity of more than 99. 99%. Sintering to 1500°C, holding for 1h - 2h, then sintering to 1750°C, holding for 2h - 4h, and sintering for 1h-2h to 1800°C - 1950°C with heat preservation 4h-6h.

Molybdenum electrodes are formed by balanced pressing, forging to various types after sintering with medium frequency furnace and then turning, rolling, planning and milling. It is used as electro-heat equipment of the glass fiber kiln. It can serve a long life in glass solution at 1300 ℃. Also used in the fields of rare earth industry.

molybdenum rod image

Compared with the prior process, the mass content of carbon and oxygen of the product of the new molybdenum electrode production method is less than 10 ppm. The new method owns the simple operation, low production cost, high production efficiency, low metal loss, and comprehensive finished products.

Generally, the purity of molybdenum target, density and homogeneity of the structure are directly connected to the quality and the thickness evenness of plated film, and then influence electrode performance the sputter important influence. Simultaneously because the dorsum electrode layer is one deck molybdenum film as thin as a wafer, even trickle inclusion all may impact the quality of film in the film, nonmetallic impurity thing especially. These strict demands to coating quality are reflected on the sputtering target, just require the weave construction of sputtering target material and chemical purity should meet corresponding technology.

 

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