The Method Prepared by Vacuum Evaporation of Tungsten Trioxide Gas Photochromic Film
- Details
- Category: Tungsten Patents
- Published on Monday, 07 July 2014 10:02
The present invention provides a vacuum evaporation of tungsten oxide gas process for preparing a photochromic film. Specific steps are as follows:
1) cleaning the substrate;
2) The tungsten trioxide powder or pressed powder into vacuum chamber by electron beam evaporation crucible, a platinum resistance wire heating source on and fixed to the cleaning of the substrate in the sample holder;
3) use the electron beam heating of the tungsten trioxide in the sublimation and deposited on the substrate. Vacuum coating machine vacuum chamber pressure of 10-2 ~ 10-3Pa, vacuum chamber temperature of about 200-300 ℃, electron beam 0.1-0.2mA;
4) a layer of a platinum catalyst deposited by resistance heating. Vacuum chamber pressure 5-6.5 × 10-3Pa, the chamber temperature is 200 - 300 ℃, steam barrier between the current 120-245A.
The present invention has a low cost, simple, good film quality, uniformity, color response time is short and so on.
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