Ti-doped Tungsten Trioxide Film Applied for FTO Conductive Glass

Some experts prepared Ti-doped tungsten trioxide film on FTO conductive glass substrates by pulsed DC reactive magnetron sputtering method under different oxygen tension conditions. They found that:

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When the oxygen tension is low, the prepared film is a triclinic system in an under-oxidized state, which is changed into a cubic crystal structure when the oxygen content increased. As the oxygen tension increases, the degree of crystallization of the film increases, the surface particles of the film gradually bulge from the sheet, the particle size decreases, the surface roughness decreases, the film density increases, and the film changes from light blue to pale yellow. As the transmittance increases, the optical band gap gradually decreases. The film's electrochromic cycle stability increases with oxygen partial pressure, first increasing and then decreasing, the optical modulation amplitude at 550nm is 62.0%. After 200 cycles, the optical modulation amplitude and CV curve of the film show no significant change, showing good electrochromic amplitude and cycle stability. At the same time, increasing the oxygen tension, the film coloring, fading response time becomes shorter, and the film discoloration rate increases. Therefore, in the process of preparing a tungsten oxide electrochromic film by reactive magnetron sputtering, increasing the oxygen tension can enhance the crystallinity of the film. The structure is more stable, and is favorable for cycle stability. But excessive oxygen tension causes the film to be too dense. And the lithium ion remains in the film and is difficult to extract so that it cannot be completely faded.

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