Crystalline Tungsten Oxide Film

Crystalline tungsten oxide film can be prepared by a reactive magnetron sputtering method under different oxygen partial pressures. The experts analyzed the surface morphology and the density of the WO3 thin films under different oxygen partial pressures, and studied the effects of surface morphology and porosity on the electrochromic properties.

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Experts have found that when the partial pressure of oxygen is 2.0×10−3mbar, the film shows a small bulk density. And it also has better ion storage capacity and coloring efficiency. That is because fine particles and dense pores favor the infusion and prolapsed of ions and electrons. Some experts also adjusted the magnetron sputtering power from 0.7kW to 1.5kW. It was found that with the increase of power, the coloring efficiency of tungsten oxide thin film decreased, and the coloring and fading time became longer. The research results show that this is due to the change of power, which make the film density increased.

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