Preparation of Coated Carbide CVD Coating Method

Chemical vapor deposition is first used in carbide blade coating method, is currently widely used in the production of coated cemented carbide of a method. Currently, carbide coating technology is developing rapidly, the development of medium-temperature chemical vapor deposition, plasma-enhanced chemical vapor deposition and chemical vapor deposition, ion sputtering method.

High-Temperature Chemical Vapor Deposition

Chemical vapor deposition basic principle is: the product to be coated carbide into high-temperature chemical vapor deposition furnace, into the compound through the reaction of steam and gases at temperatures above 1000 ℃ chemical reaction and deposited on the surface of the product.

In the high-temperature coating furnace at 1 atm for coating. The area of ​​the coating or with a heater furnace, the reaction chamber, supply, exhaust systems, gas purification system, the gas flow control system components.

In recent years, has developed a multi-layer coating structure different functions of carbide cutting tools, such as TiC-TiCN-TiN, TiC-Al2O3-TiC composite coating layer such as WC-based cemented carbide inserts. Thermal expansion coefficient of TiC carbide substrate similar to the substrate with the coating and thus high strength; outermost months crater wear resistance of TiC coating performance; intermediate layer in between the properties of TiCN coating. Therefore, to ensure the coating) 9 has excellent performance and long life. U.S. Kennametal manufacturing multilayer (8-10 layers) coated carbide by the outer, middle active layer and the underlying components. Outer TiC coating reduces the generation of tumor knife; alternating combination of 0.5-0.7μm Al2O3 (3-4 layers) / 0.2-0. 5μm of: TiN (2-3 layers) intermediate active layer, the main function can ditch Crater wear is the anti-month, reducing chipping and to increase the bond strength between layers; underlying TiN and compared with TiCN (or TiC) layer, and thus ensure that the entire coating and substrate and the active layer an intermediate bonding smoothly.

Medium temperature chemical vapor deposition: the use of organic nitriles (CH3CN) class compounds substituted methane and nitrogen coatings can reduce the temperature to 700-900C.

Plasma-enhanced chemical vapor deposition: What is the use of electrical or electromagnetic excitation of gas discharge plasma for chemical vapor product of Ya Tuo method of coating.




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