Preparation of Coated Carbide Physical Vapor Deposition Coating Method

By vacuum evaporation, sputtering, physical methods such as plasma ionization of the metal (Ti, Zr) from the melt (by evaporation) or solid (by spraying) with the gaseous phase transfer Popularity metallic component chemical reaction, the resulting compound is deposited is heated to about 500 ℃ on a cemented carbide substrate by physical vapor deposition process called coating. Physical vapor deposition coating method can trifoliate divided into three categories: deposition, sputtering and ion plating method. Date the most widely used is the pan vacuum arc evaporation, electron beam evaporation and magnetron sputtering speed. Physical vapor deposition and chemical vapor deposition has the following advantages compared.

(1) Due to the physical vapor deposition temperature is generally about 500 ℃, at this temperature, the coating and the substrate does not produce the diffusion layer, and thus the same intensity of the matrix;
(2) Coating has a fine structure, compressive stress in the coating, the coating toughness, high resistance to crack propagation capability;
(3) Coating the surface smooth, can effectively prevent the transverse crack.

Therefore, physical vapor deposition coating particularly suitable for coating the cutting insert. In order to ensure firm adhesion between coating and substrate, the substrate surface finish is very important, if the substrate surface defects, will result in the coating. Therefore, before the base coat and subject to erosion Kerry ultrasonic methods such as ion erosion processes.

Ion Plating Method

Ion plating (IP) method is a physical vapor deposition method, plasma excitation, and that the ion bombardment having an energy of the neutral atoms sputtered substrate after purification (before deposition) and the coating during the deposition process to control the nucleation and growth of process.

Vacuum Arc vapor Deposition Method

Vacuum arc vapor deposition method is a metal, an alloy or a compound arc evaporation in vacuo, ionization sputtered and deposited on the substrate a coating method.

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