Preparation of Tungsten Oxide Nano Flower Film

As a new type of material film, tungsten oxide nano-flower film has its unique performance advantages, so its preparation process has a very important role. Tungsten oxide nano flower film preparation process is as follows:

（1）The tungsten metal particles through the tungsten oxide nanowires van der Waals force close to the substrate: the quartz as a substrate, with anhydrous ethanol and deionized water respectively ultrasonic cleaning 10 minutes. The substrate is placed in a drying cabinet and dried at 120 ° C. 0.5 mg of tungsten metal powder having a particle size of 10μm was uniformly spread on the surface of the tungsten boat. Invert the substrate to the tungsten powder surface.

（2）By the thermal oxidation method, the degree of vacuum was 5 Pa, the oxygen flow rate was 2.5sccm and the argon gas flow rate was 200sccm. The substrate was gradually heated from room temperature to 800 ° C at a temperature increase rate of 60 ° C / minute and then kept for 5 minutes. Tungsten oxide nanowires are grown on the substrate so that the tungsten powder adheres to its surface. It can be seen from the electron micrograph that a dense nanowire layer is formed between the substrate and the tungsten powder and becomes an adhesive band between the substrate and the tungsten powder. Solves the problem of poor adhesion of the gas-sensing material layer due to lattice mismatch between the tungsten powder and the substrate.

（3）The tungsten metal particles on the substrate are grown as tungsten oxide nano flower films. After the substrate was face-up, the vacuum thermal evaporation coating machine. The substrate was gradually heated from room temperature to 800 ° C for 15 minutes by a seed planting method at a degree of vacuum of 5 Pa, an oxygen flow rate of 2.5sccm and an argon gas flow rate of 200sccm at a rate of 60 ° C / min. Finally, the sample was cooled to room temperature at a cooling rate of 60 ° C / min to grow the tungsten metal seed into a tungsten oxide nano flower film.

（4）Growth of tungsten oxide nano flower film: the substrate is annealed in air at 500 ℃ for 3 hours to fully oxidize the tungsten oxide nano flower structure to obtain a tungsten oxide nano flower film.

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