Tungsten Trioxide Film Formation

Tungsten trioxide film formation and growth is a relatively complex issue. First of all, the surface of the tungsten trioxide film, foreign atoms to reach the surface of the tungsten trioxide substrate, the need for further adsorption, atom drifting, atomic binding, the formation of a critical nucleus. Eventually we can grow into the tungsten oxide film we need.

The formation of tungsten trioxide thin film is summed up basically into adsorption phase, nucleation and initial growth phase of tungsten trioxide film, formation and growth phase of tungsten trioxide film.

Tungsten trioxide thin film formation process of adsorption stage, that is, under the usual evaporation pressure, tungsten trioxide atoms from the evaporation source to the base of the process, the collision does not occur during the movement without energy loss. When the incident atoms close to and reach the substrate, it also entered the substrate surface force field. After the atoms of tungsten trioxide are combined into radicals, if the size is too small, the radicals are not stable enough to adsorb newly-evaporated atoms, possibly dissociated and trapped by other big atoms.

When the atomic number of atoms in the case of enough, it will form a critical nucleus, then the atomic group will continue to grow, and further began to form a thin film of tungsten. Until ninety percent of the substrates are covered by foreign atoms, a continuous film of tungsten trioxide has been formed.

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