Manufacturing Process of Tungsten-Titanium Alloy Target

Tungsten-titanium alloy targets have been successfully applied to the diffusion barriers of Al, Cu and Ag wirings because of their low resistivity, good thermal stability and oxidation resistance. They are also widely used and applied in the semiconductor industry and in the solar industry for sputter coating.

tungsten-titanium alloy target picture

With the large-scale demand for electronic technology, tungsten-titanium alloy target manufacturing process has gradually become a hot spot of extensive research. Usually, the process of preparing tungsten-titanium alloy is as follows:

1. Take Tungsten powder having an average particle diameter of 1.0 to 2.8 μm, titanium powder having an average particle size of 40 to 60 μm and titanium hydride powder having an average particle size of 20 to 60 μm. Placed the tungsten powder, titanium powder and titanium hydride powder with mass ratio of (7.0 ~ 9.0): (0.5 ~ 1.5): (0.5 ~ 1.5) in the three-dimensional mixer, and at a speed from 40r / min to 70r / min mixed from 1.0 hour to 1.5 hour to obtain tungsten titanium alloy powder.

2. The tungsten-titanium alloy powder is placed in a vacuum hot-pressing sintering mold, compacted with stainless steel plate to be fully filled in the mold.

3. Put the mold filled with tungsten-titanium alloy powder in a vacuum hot-pressing sintering furnace and vacuum it in time.

4. Be heated from 500 to 1000 ℃ and pressurized to 280 tons until the pressure is completed and heated from 1400 ℃ to 1430 ℃ and preserve heat from 0.5 hours to 1.5 hours.

5. Adjust the power of vacuum hot-press furnace to "0". After the furnace cooled to room temperature, vacuum hot pressing sintered mold of tungsten-titanium alloy target is obtained.

6. The cut vacuum hot-pressing sintered mold is placed in a vacuum annealing furnace, heated from 800 ℃ to 1000 ℃, and annealed from 0.5 hours ~ 1.5 hours to obtain a vacuum hot-pressed sintered tungsten-titanium alloy target;

7. Put the vacuum hot-pressed tungsten-titanium alloy target into the ultrasonic cleaning tank after annealing, add proper amount of detergent and purified water to clean from 1 to 2 hours to obtain the desired tungsten-titanium alloy target.

The preparation method of the tungsten-titanium alloy target has the characteristics of uniform powder-mixing, less oxidation during preparation, low degree of impurity and high tungsten target density, which can meet the needs of the modern microelectronics industry.

 

 

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