Controlled Growth of Zn-Polar ZnO Epitaxial Film by Nitridation of Sapphire Substrate

Surface nitridation is used to eliminate O-polar inversion domains and control the growth of single-domain Zn-polar ZnO film on sapphire substrate by rf-plasma-assisted molecular-beam epitaxy. It is found that the nitridation temperature is crucial for achieving quality AlN buffer layers and ZnO films with cation polarity, as demonstrated by ex situ transmission electron microscopy. Under optimal growth conditions, a 4×4 surface reconstruction was observed, which is confirmed to be a characteristic surface structure of the Zn-polar films, and can be used as a fingerprint to optimize the ZnO growth.

The properties of 1.2 μm thick GaN films were found to be significantly influenced by the duration of exposing the sapphire substrate to ammonia prior to the GaN growth initiation. The different nitridation schemes of sapphire strongly affect the dislocation structure of GaN films resulting in a decrease of the dislocation density from 2×1010 to 4×108 cm-2 for shorter NH3 preflow times. Room‐ and low‐temperature electron transport characteristics of these films are specifically affected by the dislocation structure. A 300 K electron mobility as high as 592 cm2/V s was obtained for a short ammonia preflow whereas a long nitridation caused the mobility to drop to 149 cm2/V s. Additionally, the photoluminescence quality deteriorates for samples with a long sapphire nitridation time.


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