Titanium-doped Tungsten Trioxide Thin Film

Some experts used metal tungsten and tungsten-titanium alloy targets to prepare titanium-doped tungsten trioxide thin film by pulsed direct current reactive magnetron sputtering method. The experimental results are as follows:

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When the substrate temperature was increased to 300°C, the Ti-doped tungsten trioxide film began to change from amorphous to cubic phase; The modulation amplitude of the Ti-doped WO3 film prepared at 350°C remains unchanged of 62% after 200 cycles. Increasing oxygen partial pressure, the crystalline structure of the film transforms from monoclinic phase to cubic phase; the transmittance and the density of the film increase, the deposition rate decreases. Meanwhile, the oxygen partial pressure has little effect on the modulation amplitude of the film, and they are all in the range of 60%~64%. The cyclic stability increases first and then decreases with increasing oxygen partial pressure. At the same time, the film coloring and fading response time decreases with increasing oxygen partial pressure, and then the rate of color change of the film increases.

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