Preparing Method of Porous Tungsten Oxide Film

The invention provides a preparing method of a porous tungsten oxide film, which is characterized in that the preparing method comprises the following steps: adopting a tungsten-target and aluminum-target magnetic control co-sputtering technology to deposit tungsten and aluminum on a substrate to form an aluminum alloy film; dipping the obtained tungsten-aluminum alloy film into alkaline solutionfor selective corrosion and oxidation; and finally, obtaining the porous tungsten oxide film on the substrate.

The porous tungsten oxide film prepared with the method has even aperture distribution, and the average aperture size is about 100nm. The invention has the following obvious advancement and originality of simple preparation, easy control of technological parameters, controllable porosityand aperture size and even aperture distribution.

The product structure and the property thereof are very suitable for manufacturing electrochromic devices and air-sensitive devices.


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