Detect Chemical Vapor Deposition Equipment Anomalies Method by Gold-plated Tungsten Alloy Paperweight

The present invention provides a method for tungsten chemical vapor deposition apparatus abnormality detection. Specific steps are as follows:

1) Set the accuracy of the scan and the scan signal to noise ratio of tungsten hexafluoride with silane gas prior to the reduction reaction of the wafer to obtain the initial number of fine particles;

2) The tungsten chemical vapor deposition apparatus of silane and tungsten hexafluoride gas reduction reaction of a tungsten film on the wafer surface;

3) Scan the same SNR and a tungsten film formed on the surface accuracy of scanning the wafer number of fine particles obtained after the reaction;

4) Analyzing the number of fine particles after the initial reaction of the fine particles to increase the number of fine particles as compared to the wafer surface is a gas phase nucleation of fine particles of tungsten;

5) If the fine particles are not scanned vapor nucleation of fine particles of tungsten, tungsten chemical vapor deposition apparatus is introduced into the gas control means that no abnormality has occurred;

6) If the scan is fine particles to the gas phase nucleation of fine particles of tungsten, tungsten chemical vapor deposition apparatus is introduced into the gas control means is abnormal.

W can be accurately determined whether a chemical vapor deposition apparatus of the present invention by the method of abnormality, and the process does not affect the continuity.


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