CVD Tungsten Tube Productive Process

Reactant gas: WF₆

Reducing gas: H₂

Deposition matrix: copper tube;

Atmospheric conditions: at atmospheric pressure;

CVD (Chemical Vapor Deposition) tungsten tube productive process:

First, at a constant temperature, heating WF₆ and wait for gasification, then pass WF₆ into the mixing gas chamber until it mixes with hydrogen fully, and then pass them into the reaction chamber.

Heating the copper tube until the temperature is up to the desired deposition temperature.

WF₆ and H₂ set off a chemical reaction on the surface of copper tube; WF₆ is reduced to W atom. And the W atom will gather nucleation and grow at the copper surface, eventually forming tungsten deposits---tungsten tube.

Chemical reaction formula of WF₆ and H₂ reaction is as follows:

WF₆+ H₂→ W + 6HF (125Kj / mol)

Using gas absorption device to absorb the residual gas of WF₆ and H₂, and HF discharged from reaction chamber.


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