Advantages of CVD (Prepare Tungsten Tube)
- Details
- Category: Tungsten Information
- Published on Wednesday, 17 June 2015 18:19
Because the tungsten tube prepared by CVD (chemical vapor deposition) owns many advantages, so it has attracted many metallurgical industry and other stakeholders’ attentions.
Advantages of CVD:
Compared to the powder metallurgy process, CVD process is more simplified and stable, and the tungsten tube can be achieved by one-time forming, thus the sintering, pressing, forging and other processes can be avoided.
With fast deposition speed and high efficiency. Because the refractory metal owns large atomic radius, high melting point and other characteristics, so it is not improper to adopt PVD (Physical Vapor Deposition) and other preparation technology ---with low deposition efficiency.
Good rolling and sputtering plating. Thus the deposited product can be obtained with complex shape, compact microstructure or large size. It is also easy to implement the film layer deposition on the pipe inwall or container inwall. It can even achieve the multilayer film deposition and multi-component alloy layer deposition.
The deposited film is of high purity, good density and multi-component alloy layer ingredient can be precisely controlled.
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