CVD Tungsten Tube Morphology (2)

As the CVD (Chemical Vapor Deposition) process, by constantly absorbing tungsten atom, initially formed thin polycrystalline grain, which will grow in all directions and form the randomly oriented growth area of deposition microstructure.

After a further depositing and growing, since the cross growth of these crystal grains in all directions will stop growing due to the mutual contacting and blocking among crystal grains, so only the growth in a direction which is perpendicular to the surface of copper matrix is able to obtain required crystal grains growth space, in order to continue to grow. Because there is such a competitive growth way, so a columnar grain structure is ultimately formed, whose direction is perpendicular to the growth development of the surface, whereby the region is mainly composed of deposition layer.


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