Cs0.32WO3 Particles Applied for Ceramic Microsphere

The experts disperse the Cs0.32WO3 particles for ceramic microsphere by ball milling in deionized water, add appropriate amount of acetic acid, water, hydrofluoric acid, and stir evenly to obtain Cs0.32WO3 dispersion. Thereafter, the dispersion was incubated at 190°C for 24h in a 200mL reactor, and washed with water, alcohol, centrifuged, and dried to obtain a pure Cs0.32WO3 powder. Among them, the experts also analyzed the effect of acetic acid and hydrofluoric acid concentration on the crystal form of Cs0.32WO3 powder.

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The XRD image of the Cs0.32WO3 powder obtained by hydrothermal treatment under different acetic acid concentrations showed that the XRD image of the Cs0.32WO3 powder obtained by hydrothermal treatment under different acetic acid concentrations were consistent with the standard card of the hexagonal Cs0.32WO3 without impurity peaks. At the same time, compared with the XRD image of the non-hydrothermally treated Cs0.32WO3 powder, they found that the diffraction intensity of Cs0.32WO3 powder did not change significantly before and after the acetic acid hydrothermal treatment, indicating that the acetic acid hydrothermal treatment does not influence the degree of crystallinity of Cs0.32WO3 crystal.

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