Purity of Tungsten Tube by CVD (Chemical Vapor Deposition) Preparation

CVD (Chemical Vapor Deposition) is a vapor phase growth method for preparation of the material, which is a technology to get deposited solid thin film on the surface of matrix by means of space gas phase chemical reaction, that is to say, placing one or several elements of single substance gas and compound gas which are the content of thin film in the reaction chambers with matrix, and then they will react.

Deposition temperature is 500-700 ℃ around, and WF₆ with high purity and H₂ with high purity as raw materials to prepare the tungsten tube by CVD (Chemical Vapor Deposition).

WF₆ and H₂ make an interaction and WF₆ will reduce to tungsten atom, then, tungsten deposition layer deposited on the deposition matrix. After that, depositing tungsten tube can be gotten by chemical etching or melting in a vacuum furnace, its dimensional accuracy may be controlled.

Tungsten tube X-ray fluorescence scanning analysis showed that the purity of tungsten tube is high by CVD method, which is embodied as: in deposition film, the tungsten content is not less than 99.7%.


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