Density of Tungsten Tube by CVD (Chemical Vapor Deposition) Preparation

Adopting CVD (Chemical Vapor Deposition) method, using WF₆ and H₂as raw materials, and the deposition temperature range is about 500-700 ℃ to prepare tungsten tube.

WF₆ is reduced to tungsten atom after the chemical reaction with H₂, tungsten deposition layer will deposit on the deposition matrix. Then, the method of obtaining the deposition of tungsten tube is: either by chemical etching in the matrix or putting it in a vacuum furnace to melt.

The result which is using the buoyancy method to measure deposit density of tungsten tube at different temperature shows that under different deposition temperature, tungsten tube has a high density : >19g/cm³. As the deposition temperature increasing, the restore process accelerated, and the reduction of tungsten atoms on the deposited growth interface will be further growing, which will lead to obvious refinement of microstructure grain and growth direction of the deposited layer will tend to be messy, resulting the little decrease of deposition layer density.


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