The Manufacturing Process of Tungsten Titanium Alloy Target

Tungsten titanium alloy target with low resistance coefficient, good thermal stability and oxidation resistance properties, diffusion barrier layer has been successfully applied to Al, Cu and Ag wiring, and has been widely studied and applied in semiconductor and solar energy industries in terms of sputtering.

With the large-scale demand of electronic technology, the manufacturing process of tungsten titanium alloy target has gradually become a hot research topic. Generally, the process of preparing tungsten titanium alloys is as follows:

1. Tungsten powder having an average particle diameter of 1.0 to 2.8 um, titanium powder having an average particle size of 40 to 60 um, and titanium hydride powder having an average particle size of 20 to 60 um, hydrogenation titanium powder (7.0 ~ 9.0): (0.5 ~ 1.5): (0.5 ~ 1.5) mass ratio is placed in a three-dimensional mixer, at a speed of 40r / min ~ 70r / min conditions mixing 1.0h ~ 1.5h , to obtain tungsten titanium alloy powder;

2. The tungsten titanium alloy powder is placed in a vacuum hot-pressing sintering mold, compacted powder with stainless steel plate to fully fill the mold;

3. Put the mold filled with tungsten-titanium alloy powder in a vacuum hot-pressing sintering furnace and vacuum in time;

4. And then heated to 500 ~ 1000 ℃ and pressurized to 280 tons, until the pressure is completed and then heated to 1400 ℃ ~ 1430 ℃, holding 0.5 to 1.5 hours;

5. Then, adjust the vacuum hot press furnace power is "0", with the furnace cooled to room temperature before the furnace, to obtain a vacuum hot-rolled tungsten titanium alloy target blank;

6. The cut vacuum hot pressing sintered blank is placed in a vacuum annealing furnace, heated to 800 ℃ ~ 1000 ℃, annealed 0.5h ~ 1.5h, to obtain a vacuum hot-pressed sintered tungsten-titanium alloy target;

7. After annealing the vacuum hot-pressed tungsten titanium alloy target into the ultrasonic cleaning tank, add appropriate amount of detergent and purified water, cleaning 1 to 2 hours to obtain the desired tungsten-titanium alloy target.

The preparation method of tungsten titanium alloy target has the characteristics of uniform powder mixing, low oxidation rate and low impurity content in the preparation process. The tungsten titanium alloy has high density of target, which can meet the needs of modern microelectronics industry.

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