Tungsten Trioxide Applied for Electrochromic Thin Film

Tungsten trioxide is an important raw material for the preparation of electrochromic thin film. It is reported that WO3 and Ti doped WO3 films can be prepared by pulsed DC reactive magnetron sputtering with metal tungsten and tungsten-titanium alloy as targets. The experts studied the effects of film thickness on the crystal structure, surface morphology, and the electrochromic properties such as modulation amplitude, response time and cycle life. And they found that:

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The change of lattice strain and surface roughness after WO3 film coloration decreases first and then increases with the increase of film thickness. And they are the smallest when the film thickness is 250nm. Under the same driving voltage, when the film with a thickness of 300nm is bleached, the lithium ion migration is hindered due to excessive lattice strain, and some of the W5+ cannot be converted into W6+, so the film cannot be completely bleached, and the discoloration amplitude becomes small while the coloring efficiency decreases. The electrochromic performance of the WO3 electrochromic film is best when the film thickness is 250nm, and the optical modulation amplitude and color change efficiency are high.

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