WO3 Nanometer Array Electrochromic Film

WO3 nanometer array electrochromic film, which belongs to the field of nanotechnology, can be applied to smart windows. With the development of nanotechnology, the application of tungsten trioxide electrochromic film will be promoted. Therefore, the preparation of WO3 film is particularly important, the following are specific preparation steps:

WO3 nanometer array electrochromic film image

More details, please visit:
http://www.tungsten-powder.com/tungsten-oxide.html

WO3 nanometer array electrochromic film picture

Step one: Ultrasonic cleaning of FTO conductive glass with acetone, deionized water and ethanol for 10min, and blowing with N2 to obtain clean FTO conductive glass;

Step two: An excess of 10 mol/L of concentrated hydrochloric acid was dropped into a 1mol/L aqueous solution of sodium tungstate until no new precipitate was produced. The precipitate was washed with deionized water to obtain gelatinous precipitate - white tungstic acid. The obtained white tungstic acid was dissolved in a hydrogen peroxide aqueous solution with a mass percentage of hydrogen peroxide of 30%, and the molar ratio of white tungstic acid to hydrogen peroxide in an aqueous hydrogen peroxide solution was 1:3. Ionic water was formulated into a peroxy tungstic acid solution containing tungsten at a concentration of 3mol/L, and was refrigerated at 4°C for use;

Step three: Spin the peroxy tungstic acid solution obtained in step two with a spin coater at a speed of 3000r/min on the conductive surface of the clean FTO conductive glass for 30s, and then put it into a box furnace at 300°C. After 10min of heat preservation, repeating spin coating four times to obtain FTO conductive glass covered with a seed layer;

Step four: Add 0.1g of tungsten hexacarbonyl to a solution of 70ml of absolute ethanol and stirring to obtain a precursor solution with a concentration of tungsten hexacarbonyl of 0.00392mol/L, and adding 5μL of 10mol/L hydrochloric acid;

Step five: Based on the FTO conductive glass covered with the seed layer in the step three, the substrate was vertically erected and fixed in the reactor Teflon liner, and then the hydrochloric acid prepared in step four was added. The precursor solution was poured into the reaction kettle, and the reaction kettle was reacted at a constant temperature in a 200°C drying oven for 12h. After the reaction was completed, it was taken out from the reaction vessel, cooled with tap water, then rinsed with deionized water, vacuum dried. Then, heat treatment was performed at 400°C for 2h in a box furnace to obtain tungsten trioxide nano array electrochromic film.

 

WeChat