Factors on CVD Tungsten Tube Deposition Rate

CVD tungsten deposition rate factors tube following main points:

Reduction reaction rate;

Reduction reaction: WF₆ + H₂ → W + 6HF (125Kj/mol)

Deposition temperature: 500 ℃, 600 ℃, 700 ℃, 800 ℃

As the deposition temperature rises, the reduction reaction speed is also increasing, that is to say, W atoms generation amount is increased in unit time.

When the deposition temperature up to 700 ℃, WF6 has almost been completely consumed.

When the deposition temperature increases around 700 ℃ -800 ℃, CVD tungsten tube deposition rate trend is not very clear.

The diffusion movement speed of WF₆, H₂ and HF; as the deposition temperature increasing, WF₆, H₂ and HF diffusion speed is evident.

W atomic diffusion movement speed along the deposition surface; as the deposition temperature increases, the diffusion rate of W atoms significantly accelerated.

Speed of Crystallization.

 

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