The Surface Roughness of CVD Tungsten Tube

The surface roughness of CVD tungsten tube affected by the deposition temperature is significant, and its roughness increases with the increasing of deposition temperature.

When the deposition temperature is raised from 600 ℃to700 ℃, the surface roughness of the tungsten tube has significantly increased. Therefore, the deposition temperature should be controlled at about 600 ℃, in order to obtain deposit tungsten tube with smooth surface and good flatness.

The surface roughness of tungsten tube is mainly influenced by the growth of the film surface morphology and deposits organizations. If the deposit growth interface (Presentation of columnar crystals) is of good stability, therefore, the flatness of the surface of the film is the best. As the temperature rises to a certain extent, reduced W atoms will form nucleation again in the deposition growth interface and continue to growing, that is to say, high-temperature resulting in the change of the microstructure of the deposited layer and deposition growth interface, leading to an increase of the roughness of tungsten tube surface ultimately.


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