Overview of Tungsten Tube Performances by Chemical Vapor Deposition

The tungsten tube can be processed by CVD (chemical vapor deposition), in which WF6 and H2 are as raw material gases.

CVD is an important method for the preparation of pure tungsten products. At the end of 1970, there were related reports that foreign countries had adopted this technique for preparing high purity and high density tungsten products. In recent years, China has gradually carried out research in CVD technology on tungsten microstructure, properties, structure, coating process and other fields.

The tungsten tube processing by different deposition temperature (700 ℃, 600 ℃, 500 ℃)  is with different density, purity, residual stresses, micro-hardness and intensity.

Tungsten tube performances by chemical vapor deposition:
High purity :> 99.7%;
High density :> 19g / cm3;

Tensile strength range: 300-500Pa and it has considerable tensile strength with the conventional method of preparing tungsten rods in annealed state;

There is a larger residual stress along the radial and circumferential directions of tungsten tube;

Tungsten tube prepared by chemical vapor deposition with high purity and high density characteristics;

With the change of tungsten tube radius (4-21mm) and deposition temperature, the range of micro-hardness values is ​​between 500HB and 800HV.

 

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