Advantages of A Tungsten Heater Device

A kind of tungsten heater has the following significant advantages:

1. When heating tungsten wire at high temperatures, it would not deform or twisted. Even work continuously for dozens of hours or intermittent accumulated for several hundred of hours, it is still able to maintain its original shape, so that the life of tungsten can be maximized extend. It not only saves costs and time, but also ensures that unity of experimental conditions in a series of comparative experiments.

2. The substrate surface temperature covered by the tungsten wire can be maintained substantially uniform state, prompting area of high-temperature tungsten wire of decomposition gas increases, so the gas can be more fully decomposed, the decomposition rate of the gas increase. Quality and growth rate of the film is also improved accordingly. In CVD diamond film growth experiment, the nucleation and growth can be maintained uniform and under the high methane concentration (about 2%) , it still able to maintain a high quality film. This is because the change of tungsten wire winding way, and gas decomposition rate increases, the surface temperature of the substrate becomes uniform, as amorphous atomic hydrogen components are etched more fully.

3. The current of this kind of tungsten wire has increased over the same length of the solenoid-shaped tungsten wire current, but it will not exceed the rated current value of the transformer and the lead, so it is no need to replace for the new high current transformers. What’s more, the wolfram wire is also not affected the reaction chamber size. This kind of wolfram heater device has the characteristic of fast speed of bleeding, charging, heating and cooling, small consumption of power and gas, low-cost, which is good for CVD system for industrial applications.

The device is applicable to the diamond film, preparation and basic growth research of cubic boron nitride film and the amorphous silicon film.

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