Film on Tungsten Points Surface

Film components on tungsten points’ surface is WO₃, which is non-conductive, and whose dura layer possessing integrity and density, because it’s V_OX / V value (3.59) is more than 1. In the process of use, tungsten points’ surface would generate a tan oxide film layer, especially when they have been placed in a condition of high temperature and high humidity before using for a long time. And due to its poor conduction, the equipment would not operate.

Chemical formula:
V_OX=M_OX/D_OX
V=X*M_w/D_w
Among which,
V_OX refers to oxide volume;
M_OX refers to oxide molecular weight;
D_OX refers to oxide density;
V refers to the generated single oxide molecules’ metal volume;
X refers to single oxide molecules’ metal atom amount;
M_w refers to metal atomic weight;
D_w refers to metal density.
It is a loose, porous and incomplete oxide film when V_OX / V= M_OX* D_w/ D_OX* X*M_w＜1;
And the layer of metal oxide film possess integrity and density when V_OX / V= M_OX* D_w/ D_OX* X*M_w＞1.

 

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