The Hardness of Tungsten Tube Prepared by CVD (Chemical Vapor Deposition) (2)

At different deposition temperatures (between 500 ℃and 700 ℃), the preparation of tungsten tube is obtained by CVD (Chemical Vapor Deposition). Tungsten tube handled under the following conditions: annealing at the temperature of 1200 ℃, and holding time for 1h in vacuum annealing furnace. Compare the measurement result of the cross-section micro-hardness of tungsten tube with annealing treatment to the one without annealing; the former’s hardness fall and its cross-section distribution of the hardness value tend to be more uniform. Thanks to the annealing process, residual stress of tungsten tube (caused by column crystal squeezing each other in the process of film layer deposition and the contraction of the copper matrix) is reduced. It can be seen, tungsten tube prepared by CVD method can get high hardness (500-800HW).


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