Microstructure and Electrochromic Properties of Tungsten Oxide Thin Films

Tungsten oxide thin films were produced by reactive sputter deposition which is an advantageous method because of the opportunity to influence the properties of the films by several parameters. This work focuses on the influence of the oxygen content during the sputtering process and on mixed tungsten and molybdenum oxide films. The oxygen content has a great influence on the film growth velocity and leads to significant differences in crystal symmetry as a function of oxygen partial pressure. Additionally an influence of oxygen content on the gasochromic behaviour was observed. The mixed tungsten molybdenum oxide thin films show no change in the velocity of the gasochromic colouration but the fact that the coloured films show high absorption all over the visible region of the optical spectrum is a significant advantage.

In order to improve electrochromic properties of tungsten-oxide (WO3) thin film, polyethylene glycol (PEG)-doping WO3 films are prepared by peroxopolytungstic acid sol-gel method. Microstructure, optical and electrochiromic properties of the films by X-ray diffraction, spectral ellipsmetry, ultraviolet-visible spectrophotometer and cyclic voltammetry, respectively. The PEG-doping tungsten oxide films contain nanocrystalline / amorphous nanostructure, which facilitate ions transport in the films.Compared to pure WO3 film, the PEG-WO3 film possesses wider spectral modulation, higher coloring efficiency, good electrochromic reversibility and cyclic stability.

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