Tungsten Oxide Thin Film Target Simple Sintering Method

Tungsten oxide film is a kind of functional material which has been widely studied. It has excellent shortwave transmittance, the band gap easily through doping regulated by ion implantation and ultraviolet photon irradiation, gas adsorption, the optical and electrical properties will produce significant changes in optical glass, flat panel display, photoelectric conversion, electrochromic, photochromic and has wide application prospect.

The preparation methods of tungsten oxide thin films include physical vapor deposition, chemical vapor deposition, spray pyrolysis, anodization, electrolytic deposition, sol-gel and other methods. Physical vapor deposition is the most commonly used method. There is no doubt that the quality of tungsten oxide thin film target is decisive for the effect of physical vapor deposition, and sintered target is also an important process.

Blue tungsten oxide as the intermediate oxide, an average particle size of 15 microns), 1-5% polyethylene glycol (PEG) as a shaping agent, adding distilled water in a ball mill, wet grinding for 24-96 hours, drying and sieving, press molding under pressure of 100-200MPa, deforming agent, and then sintering under atmospheric pressure at a temperature of 1110 ℃-1400 ℃ for 60-180 minutes in a high-temperature furnace, so as to obtain a sintered blue color tungsten oxide target, purity higher than 99%, density greater than 6.80g / cm³ (relative density ≥ 94%).

This relatively simple tungsten oxide film target manufacturing method is characterized in that the tungsten oxide is sintered and densified without adding any sintering aid so that the purity of the sintered tungsten oxide is higher than 99% and the density is higher than 6.7 g / cm³ due to its high purity and high density, this dense tungsten oxide material is suitable as a target for tungsten oxide coating.

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