Tungsten Trioxide Film Ratio of Argon to Oxygen

Magnetron sputtering as one of the preparation of tungsten trioxide film preparation methods, has many unique excellent performances. In the process of preparing tungsten trioxide film by magnetron sputtering, there are many differences in the structural properties of tungsten trioxide films prepared by different argon-oxygen ratios. At the same time, the difference of argon-oxygen ratio also affects the surface properties of the tungsten trioxide film.

Comparing the transmission spectra at 4: 1, 7: 3, and 1: 1 argon-oxygen ratios, it can be found that the excessively small argon content can reduce the electrochromic properties of the tungsten trioxide films. Argon - oxygen ratio of 7: 3 under the conditions of the measured transmittance difference is the most ideal. We know that tungsten trioxide is a complex oxide with a perovskite-like structure that can be expressed as ABO3. Where B is occupied by W, and where A's cation is empty, each tungsten atom is surrounded by a regular octahedron surrounded by 6 oxygen atoms. It is because of this porosity and color changes are closely linked, thus affecting the film discoloration.

For the preparation of amorphous tungsten trioxide film, the octahedral arrangement of three-dimensional disordered network structure, which will form a natural polygon tunnel. During coloring, the ions pass through the tunnel into A's vacancy. During fading, ions are extracted from the tunnel. Therefore, we made the amorphous film is more conducive to electrochromic reasons. The appropriate oxygen flow rate of the film prepared in the colored state and fading state visible light transmittance of more than 80%, is the ideal preparation conditions.

• < Prev
• Next >