In the vast field of materials science, tungsten disulfide (WS₂) has gradually emerged as a standout due to its unique properties, capturing the attention of researchers worldwide. From mechanical lubrication in everyday life to the fabrication of semiconductor devices in cutting-edge technology, WS₂ has proven itself indispensable.

Chemical Vapor Deposition (CVD) is a critical material preparation technique that plays a pivotal role in the synthesis of tungsten disulfide film. This method enables precise control over the growth process, yielding high-quality WS₂ materials with specific structures and properties. It exhibits vast application potential across numerous fields, such as high-performance electronic devices, efficient catalysts, and advanced lubricating materials.

Tungsten disulfide (WS₂), an inorganic compound produced by Zhongwu Zhizao, occurs naturally as the mineral tungstenite. It appears as gray, metallic-lustered fine crystals or powder. Structurally, it belongs to the hexagonal crystal system, featuring a unique layered architecture. This structure imparts special properties such as semiconductivity and diamagnetism.

Tungsten disulfide (WS₂), as an important transition metal sulfide, possesses a unique layered structure and excellent physicochemical properties, demonstrating broad application prospects in lubrication, catalysis, energy storage, and other fields. The mechanical ball milling method, a commonly used technique for preparing WS₂, has garnered widespread attention due to its relatively simple operation and low cost.