The Titanium Dioxide-Tungsten Trioxide Nanocomposite Film

Typical metal oxides in semiconductors such as titanium dioxide and tungsten trioxide, have the advantages of low cost and good availability, toxic free and safe, stable biochemical properties, and resistant to light corrosion, and have become the most widely studied and widely used metal oxides.

Titanium dioxide and tungsten trioxide have been widely used as photochromic materials in energy conservation and environmental protection. Tungsten and titanium ions are close in size and can be doped into the titanium dioxide lattice to produce visible light activity. Therefore, tungsten-modified titanium dioxide has become a domain of research.

Studies have shown that tungsten trioxide accepts and stores photogenerated electrons produced by titanium dioxide, and release the stored electrons in dark conditions. It can be used for all electron-related chemical processes, such as heavy metal reduction, water splitting, metal corrosion protection and so on. Therefore, the titanium dioxide-tungsten trioxide composite structure has received extensive attention, and the preparation of the thin film electrode of the titanium oxide-tungsten oxide nanocomposite is the key to electronic storage applications.

At present, the preparation of titanium dioxide-tungsten trioxide nanocomposite film is carried out by first mixing the powder of the corresponding nano-oxide, and then coating the film on the conductive glass by various methods; or forming a film by using titanium and tungsten precursors respectively; Film formation methods include sol-gel method, electrochemical deposition, magnetron sputtering, etc. The first method is time consuming, and the second and third methods have higher equipment cost requirements. In addition, there is a chemical oxidation method in which the titanium is cleaned and etched, and then the titanium metal is immersed in the oxidizing solution of the peroxytungstic acid sol and the hydrogen peroxide to obtain crystal in situ growth. A nano film of titanic acid and peroxo-tungstic acid formed is deposited, and finally calcined to obtain a titanium oxide-tungsten oxide nanocomposite film on the surface of the metal titanium. The preparation method specifically includes the following steps:

(1) Pretreatment of titanium metal surface: the metal titanium is washed successively with deionized water and acetone, and then etched in an etching solution containing hydrofluoric acid/nitric acid, and then ultrasonically washed and dried with deionized water to obtain a surface. Clean metal titanium;

(2) Formation of a precursor film on the surface of the metal titanium: immersing the metal titanium with a clean surface after etching in a pre-formed oxidizing solution, and maintaining at a temperature of 60 to 120 ° C for 2 to 72 hours;

(3) Heat treatment of the film: Having a surface oxidation treatment on the titanium oxide. Then it is washed and dried, and baked at a certain temperature for a certain time to obtain a titanium oxide-tungsten oxide nanocomposite film with a crystal phase structure.

The titanium dioxide-tungsten trioxide nanocomposite film is prepared by chemical oxidation method. The method is easy to enlarge, and the titanium oxide and tungsten oxide are simultaneously prepared by one-step oxidation method, and the nanostructures of the two have good contact between each other, which facilitates electron transmission; the impurity film prepared is high in purity by introducing other impurity elements. The resulting thin film electrode will therefore have a excellent performance of photocatalytic, photosensor, photocharge or photodischarge.

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