High Photoelectric WO3 Film

Some experts have proposed a method for preparing a high photoelectric WO3 film, which is composed of monoclinic tungsten trioxide nanosheets. The specific steps are as follows:

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Step one: weigh 0.7mmol K2WO4•2H2O, dissolved in 30mL deionized water, 6mL 3M HCl solution was added dropwise with stirring at room temperature, then add silicotungstic acid, and the molar amount of silicotungstic acid is 15% of potassium tungstate, stir until the white precipitate no longer increases;

Step two: add 1.8mmol (NH4)2C2O4 as a structure directing agent, adding deionized water to the total volume of the solution is 70mL, and stirring is continued for 0.5h.

Step three: tilt the pre-cleaned FTO conductive glass into the reactor lining.

Step four: the solution obtained in step two is transferred into the reaction vessel, sealed, placed in a blast drying oven, hydrothermally reacted at 180°C for 16h, and naturally cooled to room temperature.

Step five: The conductive glass is taken out, washed with deionized water, dried in an oven at 60°C, and calcined at 600°C for 0.5h to obtain a tungsten trioxide film.

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